One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma
Materials (Basel)
Ho-Won Yoon 1, Seung-Min Shin 1, Seong-Yong Kwon 1, Hyun-Min Cho 2, Sang-Gab Kim 2, Mun-Pyo Hong 1 3
- DOI: 10.3390/ma14082025
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